| 1. Identificação | |
| Tipo de Referência | Artigo em Evento (Conference Proceedings) |
| Site | mtc-m16b.sid.inpe.br |
| Código do Detentor | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
| Repositório | sid.inpe.br/mtc-m17@80/2007/12.17.13.52 |
| Repositório de Metadados | sid.inpe.br/mtc-m17@80/2007/12.17.13.52.41 |
| Última Atualização dos Metadados | 2018:06.05.03.36.35 (UTC) administrator |
| Chave Secundária | INPE--PRE/ |
| Chave de Citação | OliveiraUedaRossSilv:2007:PlSoSu |
| Título | Plasma sources for surface treatments of polymeric, metallic and semiconductors materials by plasma immersion ion implantation  |
| Ano | 2007 |
| Data de Acesso | 20 maio 2024 |
| Tipo Secundário | PRE CN |
| 2. Contextualização | |
| Autor | 1 Oliveira, Rogério Moraes 2 Ueda, Mário 3 Rossi, José Osvaldo 4 Silva, Leide Lili Gonçalves |
| Grupo | 1 LAP-INPE-MCT-BR 2 LAP-INPE-MCT-BR 3 LAP-INPE-MCT-BR 4 LAP-INPE-MCT-BR |
| Afiliação | 1 Instituto Nacional de Pesquisas Espaciais (INPE) 2 Instituto Nacional de Pesquisas Espaciais (INPE) 3 Instituto Nacional de Pesquisas Espaciais (INPE) 4 Instituto Nacional de Pesquisas Espaciais (INPE) |
| Nome do Evento | Encontro Brasileiro de Física dos Plasmas, 9. |
| Localização do Evento | São Pedro, SP |
| Data | 25-28 Nov. |
| Histórico (UTC) | 2007-12-17 13:52:41 :: simone -> administrator :: 2012-10-24 00:13:34 :: administrator -> simone :: 2013-02-20 15:20:14 :: simone -> administrator :: 2007 2018-06-05 03:36:35 :: administrator -> marciana :: 2007 |
| 3. Conteúdo e estrutura | |
| É a matriz ou uma cópia? | é a matriz |
| Estágio do Conteúdo | concluido |
| Transferível | 1 |
| Tipo do Conteúdo | External Contribution |
| Resumo | The achievement of improved surface properties by means of Plasma Immersion Ion Implantation (PIII) is closely related to the type of the plasma source used and the process parameters. The e®ectiveness of such treatments is strongly dependant on the sample temperature, the plasma density, the pressure of operation, the amplitude of the applied pulse voltage, its frequency and length. Each kind of substrate demands peculiar conditions of treatment in order to achieve desirable mechanical/tribological/optical/chemical properties. This paper compiles successful results reached by PIII processes carried out in polymers (ultra high molecular weight polyethylene, kapton and mylar), semiconductors (Si, porous Si) and several metal alloys of Al and Ti, as well as H13 steel and AISI304SS, using N;H;He; Al;C;Mg and Li as implanting ions, for industrial, aerospace and medical applications. Plasma was generated by di®erent means: high voltage glow discharge mode by a home made Stacked Blumlein high voltage pulser (up to 75kV ), arc-like discharge, RF excited 500W magnetron sputtering, and low voltage dc glow discharge. In the last case the samples were pulsed by means of a high voltage pulser using hard tube apparatus for moderate energy treatments (20kV=400Hz=40¹s) and a home made compact high voltage pulser (5kV=10kHz=6¹s) for low energy implantation. Implantation depth varied from shallow (tens of nanometers) for semiconductors to thicker (hundreds of nanometers) for polymer and metal alloys. Extensive surface analysis methods were employed to characterize the treated samples, such as XPS, Auger Electron Spectroscopy, X-Ray di®raction, high resolution X-ray di®raction and Raman spectroscopy, besides measurements of micro and nanohardness, elastic modulus, resistance against corrosion, resistance against wear and friction coe±cient. The paper also presents the possibilities for hybrid PIII processes using plasmas produced by distinct solid target elements as Ca;K;Mg; Al;Bi; Sn, similar to the successful case of the lithium plasma, already obtained. |
| Área | FISPLASMA |
| Arranjo | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Plasma sources for... |
| Conteúdo da Pasta doc | não têm arquivos |
| Conteúdo da Pasta source | não têm arquivos |
| Conteúdo da Pasta agreement | não têm arquivos |
| 4. Condições de acesso e uso | |
| Idioma | pt |
| Grupo de Usuários | administrator simone administrator |
| Visibilidade | shown |
| 5. Fontes relacionadas | |
| Unidades Imediatamente Superiores | 8JMKD3MGPCW/3ET2RFS |
| Acervo Hospedeiro | lcp.inpe.br/ignes/2004/02.12.18.39 cptec.inpe.br/walmeida/2003/04.25.17.12 |
| 6. Notas | |
| Campos Vazios | archivingpolicy archivist booktitle callnumber copyholder copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress format identifier isbn issn keywords label lineage mark mirrorrepository nextedition notes numberoffiles numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup readpermission resumeid rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle size sponsor subject targetfile tertiarymark tertiarytype type url versiontype volume |
| 7. Controle da descrição | |
| e-Mail (login) | marciana |
| atualizar | |